Liquid Organic Photoresist

The only PCB company in the world to have perfected a liquid photoresist process

Our primary imaging is a wet process and is not subject to adhesion failures and other defects associated with handling dry films, including foreign objects, resulting in greater line controls at etching.

Exemplifying Candor's Simplified Manufacturing Process

Design Objectives

Customer Product Benefit
Functional, Qualitative, Aesthetic

Thick, heavy copper boards can be manufactured with ease

Excellent impdence matching - up to 2% tolerance

Landless via capabilities

Fine line capabilities

Uniform copper distribution

No dry film handling related defects

Mechanical / Electrical Superiority and/or Stability

Even coating leading to great copper distribution

Uniform copper distribution

Fewer defects

Operator Friendly
Simple, Repetitive, Basic Technical Skills

Dry Film Related Processes removed, simplifying the process.

Environmentally Friendly
Reduce, Re-use, Recycle

Liquid photoresist process removes dry film resist materials and ammonia based etch chemistry associated with it.

Simplified pre clean

Less maintenance upstream and downstream

Less defects mean less need for inspection and repair

Regulatory Compliance
Surpass Restrictions with Less Water

The process uses minimal amounts of water.

Fewer Process Step
symptom of On-Time Delivery

Reduction of many process steps compared to conventional dry resist process.

Process Control Advantage
Less monitoring, ease of use

With a reduced amount of process steps less variables need to be controlled thereby reducing monitoring.

Positive Acting Liquid Photoresist –The Linchpin of the Streamlined Manufacturing Process

By using the positive acting photoresist, Candor and thereby the customer does not need to worry about many problems related to conventional manufacturing process.

The long-lasting coating allows for a large stock of pre-coated material, enabling faster production and cost savings. Its scratch-resistant reliability ensures a consistent 5-micron thickness, allowing precise imaging with fine lines down to 2 mil without added expense.

This advanced resist also supports cupric chloride etching for both inner and outer layers, delivering superior results compared to standard ammonia-based etching. Developed by Candor’s President, Yogen Patel, this liquid photoresist process was a key innovation in his streamlined manufacturing vision. While others have struggled, Candor has perfected liquid photoresist imaging, establishing itself as an industry leader in this technology.