Liquid Organic Photoresist
The only PCB company in the world to have perfected a liquid photoresist process
Our primary imaging is a wet process and is not subject to adhesion failures and other defects associated with handling dry films, including foreign objects, resulting in greater line controls at etching.
Exemplifying Candor's Simplified Manufacturing Process
Design Objectives
Customer Product Benefit
Functional, Qualitative, AestheticThick, heavy copper boards can be manufactured with ease
Excellent impdence matching - up to 2% tolerance
Landless via capabilities
Fine line capabilities
Uniform copper distribution
No dry film handling related defects
Mechanical / Electrical Superiority and/or Stability
Even coating leading to great copper distribution
Uniform copper distribution
Fewer defects
Operator Friendly
Simple, Repetitive, Basic Technical SkillsDry Film Related Processes removed, simplifying the process.
Environmentally Friendly
Reduce, Re-use, RecycleLiquid photoresist process removes dry film resist materials and ammonia based etch chemistry associated with it.
Simplified pre clean
Less maintenance upstream and downstream
Less defects mean less need for inspection and repair
Regulatory Compliance
Surpass Restrictions with Less WaterThe process uses minimal amounts of water.
Fewer Process Step
symptom of On-Time DeliveryReduction of many process steps compared to conventional dry resist process.
Process Control Advantage
Less monitoring, ease of useWith a reduced amount of process steps less variables need to be controlled thereby reducing monitoring.
Positive Acting Liquid Photoresist –The Linchpin of the Streamlined Manufacturing Process
By using the positive acting photoresist, Candor and thereby the customer does not need to worry about many problems related to conventional manufacturing process.
The long-lasting coating allows for a large stock of pre-coated material, enabling faster production and cost savings. Its scratch-resistant reliability ensures a consistent 5-micron thickness, allowing precise imaging with fine lines down to 2 mil without added expense.
This advanced resist also supports cupric chloride etching for both inner and outer layers, delivering superior results compared to standard ammonia-based etching. Developed by Candor’s President, Yogen Patel, this liquid photoresist process was a key innovation in his streamlined manufacturing vision. While others have struggled, Candor has perfected liquid photoresist imaging, establishing itself as an industry leader in this technology.